Ultralow-loss, high-density SOI optical waveguide routing for macrochip interconnects.

Area of Science:

• Photonics and Optical Engineering
• Semiconductor Device Fabrication
• Integrated Optics

Background:

• Silicon-on-insulator (SOI) technology is crucial for integrated photonics.
• Efficient optical interconnects are needed for high-density macrochip applications.
• Minimizing signal loss in waveguides is a key challenge.

Purpose of the Study:

• To develop ultralow-loss optical waveguides for macrochip interconnects.
• To demonstrate a comprehensive routing solution using SOI CMOS.
• To enable high-density integration of photonic components.

Main Methods:

• Fabrication of optical waveguides in a 300nm thick SOI CMOS process.
• Achieving waveguide lengths up to one meter.
• Integration of tight bends and compact interlayer grating couplers.

Main Results:

• Demonstrated optical waveguides with an ultralow propagation loss of 0.026 dB/cm.
• Successfully integrated tight bends and compact grating couplers.
• Developed a complete toolbox for high-density waveguide routing.

Conclusions:

• The developed SOI CMOS process enables fabrication of meter-long, ultralow-loss waveguides.
• The integrated routing toolbox is suitable for advanced macrochip interconnects.
• This work advances the potential for high-density photonic integrated circuits.