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Inductively Coupled Plasma-Mass Spectrometry (ICP-MS): Interferences01:20

Inductively Coupled Plasma-Mass Spectrometry (ICP-MS): Interferences

Inductively coupled plasma–mass spectrometry (ICP–MS) is a highly selective and sensitive technique for accurate elemental analysis. Though the analysis of ICP–MS mass spectra is comparatively straightforward, it is affected by spectroscopic and non-spectroscopic interferences. Spectroscopic interferences arise when the plasma contains ionic species with an m/z value the same as the analyte ion. Spectroscopic interference can be categorized as isobaric, polyatomic ions, and refractory oxide ion...
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In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then passed on to...

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Automated Delivery of Microfabricated Targets for Intense Laser Irradiation Experiments
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Pattern-integrated interference lithography instrumentation.

G M Burrow1, M C R Leibovici, J W Kummer

  • 1School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0250, USA.

The Review of Scientific Instruments
|July 5, 2012
PubMed
Summary
This summary is machine-generated.

A new pattern-integrated interference lithography (PIIL) system enables precise sub-micron patterning for advanced applications. This method integrates imaging with interference lithography for fabricating photonic crystals and other subwavelength structures.

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Area of Science:

  • Optics and Photonics
  • Nanotechnology and Materials Science

Background:

  • Multi-beam interference (MBI) is crucial for creating sub-micron periodic optical-intensity distributions.
  • Applications span photonic crystals, nanoelectronics, biomedical structures, optical trapping, metamaterials, and subwavelength structures.
  • Pattern-integrated interference lithography (PIIL) integrates pattern imaging with interference lithography in a single step.

Purpose of the Study:

  • To present the design and implementation of a pattern-integrated interference exposure system (PIIES) for realizing PIIL.
  • To develop a fundamental optimization methodology for modeling the PIIES and predicting MBI-patterning performance.
  • To demonstrate the PIIL method's potential through fabricated photonic crystal structures.

Main Methods:

  • Designed and implemented a novel three-beam interference configuration with projection imaging capability.
  • Developed and applied a fundamental optimization methodology for system modeling and performance prediction.
  • Detailed alignment techniques and experimental procedures for prototype PIIES operation.

Main Results:

  • Successfully demonstrated the PIIL method using a prototype PIIES.
  • Fabricated well-defined photonic crystal structures.
  • Showcased the potential for fabricating dense integrated optical circuits and various subwavelength structures.

Conclusions:

  • The PIIES effectively realizes PIIL, enabling precise fabrication of complex subwavelength structures.
  • PIIL offers a powerful single-exposure technique for advanced optical and electronic applications.
  • The demonstrated capabilities highlight significant potential for integrated optical circuits and metamaterials.