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Published on: February 1, 2017
Vector control of induced magnetic anisotropy using an in situ quadrupole electromagnet in ultrahigh vacuum
Cheng Cheng1, Noah Sturcken, Kenneth Shepard
1Materials Science and Engineering Program, Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027, USA.
Abstract:
We demonstrate the incorporation of a quadrupole electromagnet into an ultrahigh vacuum sputtering system for the vector control of induced magnetic anisotropy in magnetic thin-film heterostructures. A stationary quadrupole electromagnet is used to generate a magnetic field, which rotates synchronously with the physical axes of the substrate in situ during sputtering. An arbitrary anisotropy direction can be set for successive ferromagnetic layers by adjusting the phase difference of substrate and field rotation. The ability to rotate the substrate during deposition and change anisotropy without breaking vacuum enables the deposition of magnetically soft heterostructures with arbitrary in-plane anisotropy axes.
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