Nanopatterning by direct-write atomic layer deposition
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Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
A J M Mackus1, S A F Dielissen, J J L Mulders
1Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands. a.j.m.mackus@tue.nl
Nanoscale
|July 5, 2012
Abstract:
A novel direct-write approach is presented, which relies on area-selective atomic layer deposition on seed layer patterns deposited by electron beam induced deposition. The method enables the nanopatterning of high-quality material with a lateral resolution of only ∼10 nm. Direct-write ALD is a viable alternative to lithography-based patterning with a better compatibility with sensitive nanomaterials.
