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Related Concept Videos

Standing Waves in a Cavity01:28

Standing Waves in a Cavity

A household microwave and lasers are examples of standing electromagnetic waves in a cavity. When two conducting metal plates are placed parallel at the nodal planes, it creates a cavity where standing waves are formed. The cavity between the two planes is analogous to a stretched string held at the points x = 0 and x = L. Here, the distance 'L' between the two planes must be an integer multiple of half of the wavelength. The wavelengths that satisfy this condition are given by:

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Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection.

A J R van den Boogaard1, F A van Goor, E Louis

  • 1FOM Institute for Plasma Physics Rijnhuizen, Nieuwegein, The Netherlands. a.j.r.vandenboogaard@rijnhuizen.nl

Optics Letters
|August 3, 2012
PubMed
Summary
This summary is machine-generated.

Researchers developed a Mo/Si multilayer-grating system for extreme ultraviolet (EUV) lithography. This system achieves high reflectance and spectral filtering, offering a solution for out-of-band radiation suppression.

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Area of Science:

  • Optics and Photonics
  • Materials Science
  • Nanotechnology

Background:

  • Extreme ultraviolet (EUV) lithography is crucial for semiconductor manufacturing.
  • Suppression of out-of-band radiation (λ>100 nm) is essential for EUV lithography performance.
  • Multilayer reflectors are key components in EUV optical systems.

Purpose of the Study:

  • To report a generic design and fabrication scheme for Mo/Si multilayer-grating phaseshift reflector systems.
  • To demonstrate high reflectance values for EUV applications.
  • To explore the potential of these systems in spectral filtering and out-of-band radiation suppression.

Main Methods:

  • Fabrication of Mo/Si multilayer-grating structures.
  • Characterization of optical properties, including reflectance.
  • Design and simulation of phaseshift reflector systems.

Main Results:

  • Achieved near-optimized extreme ultraviolet (EUV, λ=13.5 nm) reflectance values up to 64%.
  • Demonstrated the diffractive properties of the multilayer gratings.
  • Validated the potential for spectral filtering applications.

Conclusions:

  • The developed Mo/Si multilayer-grating phaseshift reflector systems show promising performance for EUV lithography.
  • These systems can serve as a wavelength-unspecific solution for suppressing unwanted out-of-band radiation.
  • The findings contribute to advancing EUV lithography technology through improved optical components.