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Published on: February 11, 2020
Micro-PIXE and micro-RBS characterization of micropores in porous silicon prepared using microwave-assisted
Muthanna Ahmad1, Geoffrey W Grime
1IBA Laboratory, Chemistry Department, Atomic Energy Commission of Syria, P.O. Box 6091, Damascus, Syria.
Abstract:
Porous silicon (PS) has been prepared using a microwave-assisted hydrofluoric acid (HF) etching method from a silicon wafer pre-implanted with 5 MeV Cu ions. The use of microbeam proton-induced X-ray emission (micro-PIXE) and microbeam Rutherford backscattering techniques reveals for the first time the capability of these techniques for studying the formation of micropores. The porous structures observed from micro-PIXE imaging results are compared to scanning electron microscope images. It was observed that the implanted copper accumulates in the same location as the pores and that at high implanted dose the pores form large-scale patterns of lines and concentric circles. This is the first work demonstrating the use of microwave-assisted HF etching in the formation of PS.
