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Updated: May 13, 2026
10:42
Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh
Published on: May 3, 2019
Performance of an inverted ion source.
M C Salvadori1, F S Teixeira, L G Sgubin
1Institute of Physics, University of São Paulo, C.P. 66318, CEP 05315-970, São Paulo S.P., Brazil. mcsalva@if.usp.br
The Review of Scientific Instruments
|March 8, 2013
Summary
Researchers developed an inverted ion source, grounding the plasma and using a negative potential for energetic ion beams. This cost-effective design enables applications like small-scale ion implantation.
Area of Science:
- Plasma Physics
- Ion Beam Technology
- Materials Science
Background:
- Conventional energetic ion beams rely on high-potential plasma extraction.
- This setup presents technological and economic limitations for certain applications.
Purpose of the Study:
- Introduce and characterize an "inverted ion source" configuration.
- Demonstrate cost-effective energetic ion beam generation.
- Explore feasibility for small-scale ion implantation.
Main Methods:
- Developed an inverted ion source using a metal vapor vacuum arc plasma.
- Varied parameters: extraction voltage (5-35 kV), arc current (50-230 A), ion species (Ti, Nb, Au).
- Measured downstream beam current using a magnetically-suppressed Faraday cup.
Main Results:
- Achieved downstream ion beam currents up to 600 mA.
- Observed beam characteristics similar to conventional sources.
- Demonstrated parametric influence on beam current.
Conclusions:
- The inverted ion source offers a technologically and economically viable alternative.
- This configuration expands possibilities for ion beam applications, especially small-scale ion implantation.
- The developed device shows promising performance comparable to traditional methods.
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