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Related Experiment Video

Updated: May 13, 2026

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh

Preparing an Isotopically Pure ²²⁹Th Ion Beam for Studies of ^229mTh

Published on: May 3, 2019

Performance of an inverted ion source.

M C Salvadori¹, F S Teixeira, L G Sgubin

¹Institute of Physics, University of São Paulo, C.P. 66318, CEP 05315-970, São Paulo S.P., Brazil. mcsalva@if.usp.br

The Review of Scientific Instruments

|March 8, 2013

Summary

Researchers developed an inverted ion source, grounding the plasma and using a negative potential for energetic ion beams. This cost-effective design enables applications like small-scale ion implantation.

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Area of Science:

Plasma Physics
Ion Beam Technology
Materials Science

Background:

Conventional energetic ion beams rely on high-potential plasma extraction.
This setup presents technological and economic limitations for certain applications.

Purpose of the Study:

Introduce and characterize an "inverted ion source" configuration.
Demonstrate cost-effective energetic ion beam generation.
Explore feasibility for small-scale ion implantation.

Main Methods:

Developed an inverted ion source using a metal vapor vacuum arc plasma.
Varied parameters: extraction voltage (5-35 kV), arc current (50-230 A), ion species (Ti, Nb, Au).
Measured downstream beam current using a magnetically-suppressed Faraday cup.

Main Results:

Achieved downstream ion beam currents up to 600 mA.
Observed beam characteristics similar to conventional sources.
Demonstrated parametric influence on beam current.

Conclusions:

The inverted ion source offers a technologically and economically viable alternative.
This configuration expands possibilities for ion beam applications, especially small-scale ion implantation.
The developed device shows promising performance comparable to traditional methods.