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Hybrid III-V/silicon single-mode laser with periodic microstructures.
Yejin Zhang1, Hongwei Qu, Hailing Wang
1State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China.
Optics Letters
|March 19, 2013
Summary
Researchers developed a hybrid III-V/silicon laser for photonic integration circuits. This novel device operates in the C band, offering a cost-effective solution with promising output power and side mode suppression.
Area of Science:
- Photonics and optoelectronics
- Materials science
- Integrated optics
Background:
- Photonic integration circuits (PICs) require efficient and compact light sources.
- Hybrid III-V/silicon approaches offer a pathway to combine the advantages of different material systems.
Purpose of the Study:
- To present a novel hybrid III-V/silicon single-mode laser for C-band operation.
- To demonstrate a cost-effective fabrication process for integrated photonic devices.
Main Methods:
- Wafer-to-wafer direct bonding of InGaAlAs gain structure onto patterned silicon-on-insulator.
- Implementation of a mode-selective mechanism using a hybrid III-V/silicon straight cavity with periodic microstructures.
- Utilizing low-cost i-line projection photolithography for the fabrication process.
Main Results:
- Achieved 0.62 mW output power at room temperature in continuous-wave operation.
- Demonstrated a side mode suppression ratio (SMSR) greater than 20 dB.
- Successful integration of III-V gain material with silicon photonics.
Conclusions:
- The developed hybrid laser is a viable light source for C-band photonic integration circuits.
- The fabrication method using i-line lithography is cost-effective and scalable.
- This work contributes to the advancement of integrated optoelectronics by enabling efficient hybrid laser fabrication.

