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Published on: May 15, 2017
Resistive phase transition of the superconducting Si(111)-(7×3)-In surface
Takashi Uchihashi1, Puneet Mishra, Tomonobu Nakayama
1International Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), , 1-1, Namiki, Tsukuba, Ibaraki, 305-0044, Japan. UCHIHASHI.Takashi@nims.go.jp.
Abstract:
: Recently, superconductivity was found on semiconductor surface reconstructions induced by metal adatoms, promising a new field of research where superconductors can be studied from the atomic level. Here we measure the electron transport properties of the Si(111)-(7×3)-In surface near the resistive phase transition and analyze the data in terms of theories of two-dimensional (2D) superconductors. In the normal state, the sheet resistances (2D resistivities) R□ of the samples decrease significantly between 20 and 5 K, suggesting the importance of the electron-electron scattering in electron transport phenomena. The decrease in R□ is progressively accelerated just above the transition temperature (Tc) due to the direct (Aslamazov-Larkin term) and the indirect (Maki-Thompson term) superconducting fluctuation effects. A minute but finite resistance tail is found below Tc down to the lowest temperature of 1.8 K, which may be ascribed to a dissipation due to free vortex flow. The present study lays the ground for a future research aiming to find new superconductors in this class of materials.
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