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Updated: May 12, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
A monochromatic, aberration-corrected, dual-beam low energy electron microscope
Marian Mankos1, Khashayar Shadman
1Electron Optica Inc., 1000 Elwell Court #110, Palo Alto, CA 94303, USA. marian@electronoptica.com
The novel monochromatic, aberration-corrected, dual-beam low energy electron microscope (MAD-LEEM) offers sub-nanometer imaging for biological and insulating samples. This advanced instrument minimizes beam damage, enabling high-resolution DNA sequencing applications.
Area of Science:
- * Materials Science
- * Surface Science
- * Electron Microscopy
Background:
- * Conventional low-energy electron microscopy (LEEM) struggles with imaging insulating and biological specimens due to charging and beam damage.
- * Existing techniques like Low-Voltage Scanning Electron Microscopy (LVSEM) and Transmission Electron Microscopy (TEM) have limitations in resolution or sample compatibility.
- * There is a need for advanced imaging tools capable of high-resolution, low-impact analysis of delicate nanostructures.
Purpose of the Study:
- * To introduce and detail the design and capabilities of the monochromatic, aberration-corrected, dual-beam low energy electron microscope (MAD-LEEM).
- * To highlight MAD-LEEM's suitability for imaging biological and insulating specimens with sub-nanometer resolution.
- * To explore the potential of MAD-LEEM for applications such as high-resolution, low-cost DNA sequencing.
Main Methods:
- * Integration of a monochromator to reduce electron beam energy spread, enhancing spatial and spectroscopic resolution.
- * Implementation of an aberration corrector using an electron mirror to compensate for objective lens aberrations.
- * Utilization of dual flood illumination to mitigate charging effects on insulating samples.
Main Results:
- * MAD-LEEM achieves sub-nanometer resolution imaging, surpassing conventional LEEM capabilities.
- * The instrument effectively images biological and insulating specimens without significant charging.
- * Low electron impact energies minimize beam damage, crucial for sensitive materials like DNA.
- * Image contrast simulations indicate feasibility for detecting individual DNA nucleotides.
Conclusions:
- * MAD-LEEM represents a significant advancement in electron microscopy, enabling high-resolution imaging of previously challenging samples.
- * The technology offers a promising platform for applications requiring high resolution, low beam energy, and minimal sample preparation, such as DNA sequencing.
- * Further development of MAD-LEEM optics and contrast simulations will refine its capabilities for nucleotide detection and other nanoscale analyses.
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