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Related Concept Videos

MOS Capacitor01:25

MOS Capacitor

A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...

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Related Experiment Video

Updated: May 12, 2026

Elaborate Control of Inkjet Printer for Fabrication of Chip-based Supercapacitors
10:57

Elaborate Control of Inkjet Printer for Fabrication of Chip-based Supercapacitors

Published on: November 30, 2021

Direct laser-patterned micro-supercapacitors from paintable MoS2 films.

Liujun Cao1, Shubin Yang, Wei Gao

  • 1Department of Mechanical, Engineering & Materials Science, Rice University, Houston, Texas 77005, USA; School of Chemistry and Chemical Engineering, Chongqing University, Chongqing 400044, China.

Small (Weinheim an Der Bergstrasse, Germany)
|April 17, 2013
PubMed
Summary

Researchers developed spray-painted molybdenum disulfide (MoS2) micro-supercapacitors for micro-electronic devices. These high-capacitance energy storage devices show superior performance compared to graphene alternatives.

Keywords:
MoS2laser patterningmicro-supercapacitorsnanosheetspaintable films

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Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
12:38

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Published on: December 16, 2011

Related Experiment Videos

Last Updated: May 12, 2026

Elaborate Control of Inkjet Printer for Fabrication of Chip-based Supercapacitors
10:57

Elaborate Control of Inkjet Printer for Fabrication of Chip-based Supercapacitors

Published on: November 30, 2021

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
12:38

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Published on: December 16, 2011

Area of Science:

  • Materials Science
  • Electrochemistry
  • Nanotechnology

Background:

  • Micrometer-sized electrochemical capacitors are crucial for micro-electronic devices.
  • Developing scalable and cost-effective fabrication methods for these devices is essential.

Purpose of the Study:

  • To demonstrate a novel, large-scale fabrication method for high-capacitance, two-dimensional molybdenum disulfide (MoS2) film-based micro-supercapacitors.
  • To evaluate the electrochemical performance of these MoS2 micro-supercapacitors.

Main Methods:

  • Spray painting of MoS2 nanosheets onto Si/SiO2 chips.
  • Laser patterning to create interdigitated electrodes.
  • Electrochemical testing with aqueous electrolytes.

Main Results:

  • Fabrication of well-defined micro-supercapacitors with specific electrode dimensions (4.5 mm length, 820 μm width, 200 μm spacing, ~0.45 μm thickness).
  • Achieved high area capacitance of 8 mF cm⁻² (178 F cm⁻³ volumetric capacitance).
  • Demonstrated excellent cyclic performance, outperforming reported graphene-based micro-supercapacitors.

Conclusions:

  • The spray painting and laser patterning strategy offers a simple, low-cost approach for fabricating MoS2 micro-supercapacitors.
  • These MoS2 micro-supercapacitors exhibit superior electrochemical energy storage capabilities.
  • This method holds promise for developing diverse micro-/nanosized energy storage devices for portable, flexible, and transparent electronics.