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Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
GdN nanoisland-based GaN tunnel junctions.
Sriram Krishnamoorthy1, Thomas F Kent, Jing Yang
1Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA.
Nano Letters
|May 14, 2013
Summary
Gadolinium nitride (GdN) nanoislands significantly improve hole injection in gallium nitride (GaN) p-n junctions. This breakthrough enables lower resistance tunnel junctions for efficient light-emitting diodes and lasers.
Area of Science:
- Materials Science
- Semiconductor Physics
- Optoelectronics
Background:
- Gallium nitride (GaN) and aluminum nitride (AlN)-based devices face challenges with hole injection and p-contacts.
- Efficient tunnel junctions are crucial for advanced optoelectronic devices like LEDs and lasers.
Purpose of the Study:
- To demonstrate GdN nanoislands for enhancing interband tunneling and hole injection in GaN p-n junctions.
- To achieve low specific resistivity in tunnel junctions for wide bandgap semiconductors.
Main Methods:
- Fabrication of GaN p-n junctions incorporating GdN nanoisland layers.
- Characterization of tunnel junction properties, including specific resistivity.
- Low-temperature electroluminescence measurements to confirm tunnel injection.
Main Results:
- GdN nanoislands enhanced hole injection by several orders of magnitude.
- Achieved a low tunnel junction specific resistivity of 1.3 × 10(-3) Ω-cm(2).
- Confirmed tunnel injection via low-temperature operation (down to 20 K) with strong electroluminescence.
Conclusions:
- GdN nanoislands effectively overcome hole injection challenges in GaN devices.
- The low resistance and low optical absorption of GdN are highly promising for GaN-based light emitters.
- This approach offers a pathway to improved performance in wide bandgap optoelectronics.
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