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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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Synthesis and structure of the [(UO2)S4]6- anion: a cation-stabilized uranyl sulfide

Matthew D Ward1, Jordan M Klingsporn, James A Ibers

  • 1Department of Chemistry, Northwestern University , Evanston, Illinois 60208-3113, United States.

Inorganic Chemistry
|September 6, 2013
PubMed

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