Related Experiment Video
Updated: May 8, 2026

11:42
Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Highly tunable local gate controlled complementary graphene device performing as inverter and voltage controlled
Wonjae Kim1, Juha Riikonen, Changfeng Li
1Department of Micro- and Nanosciences, Aalto University, Tietotie 3, FI-02150 Espoo, Finland.
Nanotechnology
|September 10, 2013
Summary
This study demonstrates a graphene field-effect transistor (FET) with local back-gate control for tunable characteristics. This enables low-voltage operation and versatile configurations for advanced logic circuits.
Area of Science:
- Materials Science
- Nanotechnology
- Electronics Engineering
Background:
- Graphene field-effect transistors (FETs) offer potential for advanced electronics.
- Controlling doping in graphene channels is crucial for device performance.
- Unintentional doping variations in chemical vapor deposition (CVD) graphene pose challenges.
Purpose of the Study:
- To develop a graphene FET with independently controllable electrostatic doping.
- To achieve tunable device characteristics and compensate for doping variations.
- To explore novel configurations and applications in logic circuitry.
Main Methods:
- Fabrication of single-layer CVD graphene FETs with separated local back-gates.
- Utilizing local back-gate control for electrostatic doping of graphene channels.
- Operating devices at room temperature with low bias voltages.
Main Results:
- Demonstrated highly tunable device characteristics through independent control of electrostatic doping.
- Achieved device operation with very low supply voltage (VDD).
- Successfully compensated for unintentional doping variations in CVD graphene.
- Obtained both p-n and n-p configurations via electrostatic doping.
- Switched device operation between inverter and voltage-controlled resistor modes.
Conclusions:
- Local back-gating provides precise control over graphene FET doping and characteristics.
- The developed device architecture enables low-power operation and compensates for graphene variability.
- This approach opens new avenues for graphene-based logic circuitry and electronic applications.
Related Concept Videos
MOSFET: Enhancement Mode
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no current...
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no current...
MOSFET Amplifiers
The MOSFET, when operating in its active region, functions as a voltage-controlled current source. In this region, the gate-to-source voltage controls the drain current. This principle underlies the operation of the transconductance MOSFET amplifier. The output current is directed through a load resistor to convert this amplifier into a voltage amplifier. The output voltage is then obtained by subtracting the voltage drop across the load resistance from the supply voltage. This process results...
Characteristics of MOSFET
Metal-oxide-semiconductor field-effect Transistors, or MOSFETs, play a critical role in electronic circuits. They are primarily utilized for amplifying and switching signals.
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable quicker...
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable quicker...
MOS Capacitor
A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
MOSFET
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) plays a pivotal role in modern electronics thanks to its versatility and efficiency in controlling electrical currents. This device, also known as IGFET, MISFET, and MOSFET, has three main terminals: the Source, Drain, and Gate. MOSFETs are classified into n-channel or p-channel types based on the doping characteristics of their substrate and the source or drain regions.
In an n-MOSFET, the structure includes n-type source and drain...
In an n-MOSFET, the structure includes n-type source and drain...
Biasing of FET
Biasing a Junction Field Effect Transistor (JFET) is crucial for setting operational parameters and ensuring efficient functioning in electronic circuits. JFETs are characterized by using a single carrier type in N-channel or P-channel configurations, where the channel is surrounded by PN junctions. These junctions are central to the device's ability to control current flow.
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the gate...
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the gate...

