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High-quality crystallinity controlled ALD TiO2 for waveguiding applications.

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    We developed a new atomic layer deposition (ALD) method for high-quality titanium dioxide (TiO2) waveguides. This process uses intermediate aluminum oxide (Al2O3) layers to control crystal size, significantly reducing optical losses.

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    Area of Science:

    • Materials Science
    • Nanotechnology
    • Optical Engineering

    Background:

    • Nanocrystalline titanium dioxide (TiO2) is a promising material for optical applications due to its high refractive index and third-order optical nonlinearity.
    • Controlling crystal size in TiO2 thin films is crucial for minimizing optical scattering losses in waveguides.
    • Existing deposition methods often result in large crystal sizes, leading to high losses and limiting their use in optical devices.

    Purpose of the Study:

    • To demonstrate a novel atomic layer deposition (ALD) process for fabricating high-quality nanocrystalline TiO2 thin films.
    • To investigate the effect of intermediate aluminum oxide (Al2O3) layers on controlling TiO2 crystal size and optical properties.
    • To evaluate the performance of ALD-grown TiO2 as a waveguide material by measuring optical losses and third-order optical nonlinearity.

    Main Methods:

    • Utilized a novel ALD process employing titanium chloride (TiCl4)+water and trimethyl aluminum (TMA)+ozone chemistries at a deposition temperature of 250°C.
    • Incorporated intermediate Al2O3 layers within the TiO2 structure to limit nanocrystal growth.
    • Measured waveguide losses at 633 and 1551 nm using a prism coupling method and assessed third-order optical nonlinearity via third-harmonic generation microscopy.

    Main Results:

    • Achieved low waveguide losses as low as 0.2±0.1 dB/mm at 633 and 1551 nm for TiO2 films with the smallest crystal size.
    • Observed that optical losses increase with increasing crystal size, highlighting the importance of crystal size control.
    • Plain TiO2 films deposited without Al2O3 interlayers exhibited high scattering losses, rendering them unsuitable for waveguide applications.
    • Third-order optical nonlinearity decreased with smaller crystal sizes but remained substantial across all samples.

    Conclusions:

    • ALD-grown TiO2 with controlled crystallinity is an excellent candidate for optical applications requiring high thermal stability and significant third-order optical nonlinearity.
    • The novel ALD process with intermediate Al2O3 layers effectively suppresses crystal growth, leading to low-loss optical waveguides.
    • This technique offers a viable pathway for fabricating high-performance optical components using TiO2.