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Published on: December 7, 2017
Fabrication of silicon nanowire arrays by macroscopic galvanic cell-driven metal catalyzed electroless etching in
Lin Liu1, Kui-Qing Peng, Ya Hu
1Department of Physics and Beijing Key Laboratory of Energy Conversion and Storage Materials, Beijing Normal University, Beijing, 100875, China.
Abstract:
Macroscopic galvanic cell-driven metal catalyzed electroless etching (MCEE) of silicon in aqueous hydrofluoric acid (HF) solution is devised to fabricate silicon nanowire (SiNW) arrays with dissolved oxygen acting as the one and only oxidizing agent. The key aspect of this strategy is the use of a graphite or other noble metal electrode that is electrically coupled with silicon substrate.
