Combining focused ion beam and atomic layer deposition in nanostructure fabrication

Zhongmei Han1, Marko Vehkamäki, Markku Leskelä

  • 1Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki, FIN-00014, Finland.

Nanotechnology
|February 22, 2014
PubMed
Summary

Focused ion beam milling combined with atomic layer deposition enables 3D nanostructure fabrication. Optimizing ion beam angles enhances thermal stability of milled silicon, crucial for microelectronic device prototyping.