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Updated: May 2, 2026

Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry
Published on: August 1, 2017
Development of a high-temperature oven for the 28 GHz electron cyclotron resonance ion source
J Ohnishi1, Y Higurashi1, M Kidera1
1RIKEN Nishina Center, Wako, Saitama 351-0198, Japan.
Abstract:
We have been developing the 28 GHz ECR ion source in order to accelerate high-intensity uranium beams at the RIKEN RI-beam Factory. Although we have generated U(35+) beams by the sputtering method thus far, we began developing a high-temperature oven with the aim of increasing and stabilizing the beams. Because the oven method uses UO2, a crucible must be heated to a temperature higher than 2000 °C to supply an appropriate amount of UO2 vapor to the ECR plasma. Our high-temperature oven uses a tungsten crucible joule-heated with DC current of approximately 450 A. Its inside dimensions are ϕ11 mm × 13.5 mm. Since the crucible is placed in a magnetic field of approximately 3 T, it is subject to a magnetic force of approximately 40 N. Therefore, we used ANSYS to carefully design the crucible, which was manufactured by machining a tungsten rod. We could raise the oven up to 1900 °C in the first off-line test. Subsequently, UO2 was loaded into the crucible, and the oven was installed in the 28 GHz ECR ion source and was tested. As a result, a U(35+) beam current of 150 μA was extracted successfully at a RF power of approximately 3 kW.

