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Updated: May 2, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Resolution enhancement at a large convergence angle by a delta corrector with a CFEG in a low-accelerating-voltage
Hidetaka Sawada1, Takeo Sasaki1, Fumio Hosokawa1
1JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan.
Abstract:
Resolution reduction by a diffraction limit becomes severe with an increase in the wavelength of an electron at a relatively low accelerating voltage. For maintaining atomic resolution at a low accelerating voltage, a larger convergence angle with aberration correction is required. The developed aberration corrector, which compensates for higher-order aberration, can expand the uniform phase angle. Sub-angstrom imaging of a Ge [112] specimen with a narrow energy spread obtained by a cold field emission gun at 60 kV was performed using the aberration corrector. We achieved a resolution of 82 pm for a Ge-Ge dumbbell structure image by high angle annular dark-field imaging.
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