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Updated: May 1, 2026

Fabrication of Low Temperature Carbon Nanotube Vertical Interconnects Compatible with Semiconductor Technology
Published on: December 7, 2015
One-step sub-10 μm patterning of carbon-nanotube thin films for transparent conductor applications
Norihiro Fukaya1, Dong Young Kim, Shigeru Kishimoto
1Department of Quantum Engineering, Nagoya University , Furo-cho, Chikusa-ku, Nagoya 464-8603 Japan.
Abstract:
We propose a technique for one-step micropatterning of as-grown carbon-nanotube films on a plastic substrate with sub-10 μm resolution on the basis of the dry transfer process. By utilizing this technique, we demonstrated the novel high-performance flexible carbon-nanotube transparent conductive film with a microgrid structure, which enabled improvement of the performance over the trade-off between the sheet resistance and transmittance of a conventional uniform carbon-nanotube film. The sheet resistance was reduced by 46% at its maximum by adding the microgrid, leading to a value of 53 Ω/sq at a transmittance of 80%. We also demonstrated easy fabrication of multitouch projected capacitive sensors with 12 × 12 electrodes. The technique is quite promising for energy-saving production of transparent conductor devices with 100% material utilization.
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