An atomic layer deposition chamber for in situ x-ray diffraction and scattering analysis
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Updated: Jan 26, 2026

Crystallization of Proteins on Chip by Microdialysis for In Situ X-ray Diffraction Studies
Published on: April 11, 2021
Scott M Geyer1, Rungthiwa Methaapanon1, Richard W Johnson2
1Department of Chemical Engineering, Stanford University, Stanford, California 94305, USA.
Abstract:
The crystal structure of thin films grown by atomic layer deposition (ALD) will determine important performance properties such as conductivity, breakdown voltage, and catalytic activity. We report the design of an atomic layer deposition chamber for in situ x-ray analysis that can be used to monitor changes to the crystal structural during ALD. The application of the chamber is demonstrated for Pt ALD on amorphous SiO2 and SrTiO3 (001) using synchrotron-based high resolution x-ray diffraction, grazing incidence x-ray diffraction, and grazing incidence small angle scattering.
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