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A novel method for photolithographic polymer shadow masking: toward high-resolution high-performance top-contact
Deyang Ji1, Longfeng Jiang, Lang Jiang
1Beijing National Laboratory for Molecular Science, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China. huwp@iccas.ac.cn ljiang@iccas.ac.cn.
Chemical Communications (Cambridge, England)
|June 19, 2014
Abstract:
A novel and universal method, based on water-soluble poly(4-styrene sulfonate), was introduced into the preparation of a polymer mask. Using this mask, high-resolution, high-performance, bottom-gate, top-contact OFETs can be achieved. There is no solvent intervention in the process of manufacturing these OFETs and the mask can be recycled.
