Performance simulation of 2D photonic-crystal devices fabricated by pattern-integrated interference lithography

Area of Science:

• Nanofabrication
• Photonic Crystals
• Optical Engineering

Background:

• Photonic crystals offer significant potential applications in optics and photonics.
• Existing fabrication methods can be complex and time-consuming.
• Pattern-integrated interference lithography (PIIL) is a novel technique for creating periodic structures.

Purpose of the Study:

• To simulate the fabrication of two-dimensional (2D) photonic-crystal devices using PIIL.
• To evaluate fabrication errors, including motif-area and motif-displacement.
• To assess the performance of PIIL-fabricated devices compared to theoretical models.

Main Methods:

• Rigorous vector modeling was employed to simulate the PIIL process.
• Realistic photolithographic conditions were incorporated into the simulations.
• Etched patterns in silicon were modeled to quantify fabrication errors.
• Device intensity transmission spectra were calculated to evaluate optical performance.

Main Results:

• Simulations successfully modeled the fabrication of 2D photonic crystals via PIIL.
• Photonic-crystal motif-area and motif-displacement errors were quantified.
• Calculated transmission spectra demonstrated high performance for PIIL-produced devices.
• Performance of PIIL devices was found to be comparable, and in some cases superior, to idealized equivalents.

Conclusions:

• PIIL is a viable and effective technique for fabricating high-performance 2D photonic crystals.
• The simulation accurately predicts the performance of PIIL-fabricated devices.
• PIIL offers a promising route for rapid, wafer-scale production of advanced photonic devices.