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Refractory plasmonics with titanium nitride: broadband metamaterial absorber
Wei Li1, Urcan Guler, Nathaniel Kinsey
1School of Electrical & Computer Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN, 47907, USA; State Key Lab of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan, 430070, China.
Advanced Materials (Deerfield Beach, Fla.)
|October 21, 2014
Summary
A novel titanium nitride plasmonic absorber achieves 95% broadband absorption. This high-temperature stable device, only 240 nm thick, is suitable for solar energy and optical applications.
Area of Science:
- Materials Science
- Optics
- Nanotechnology
Background:
- Broadband plasmonic absorbers are crucial for advanced optical applications.
- Existing absorbers often lack high-temperature stability or require complex fabrication.
- Titanium nitride (TiN) offers a promising refractory material for plasmonic devices.
Purpose of the Study:
- To design and fabricate a high-temperature stable broadband plasmonic absorber.
- To achieve high absorption across a broad spectrum.
- To explore the potential of titanium nitride for plasmonic applications.
Main Methods:
- Design of a nanostructured plasmonic absorber incorporating plasmonic resonances and dielectric-like loss.
- Fabrication using a refractory material, titanium nitride.
- Optical characterization to determine absorption performance.
Main Results:
- A broadband plasmonic absorber with an average absorption of 95% was successfully fabricated.
- The device exhibits high-temperature stability.
- The total thickness of the absorber is 240 nm.
Conclusions:
- The fabricated titanium nitride plasmonic absorber demonstrates excellent broadband absorption and high-temperature stability.
- The integration of plasmonic resonances and dielectric-like loss is an effective strategy.
- This work paves the way for applications in solar thermophotovoltaics and optical circuits.
