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Enhancing one dimensional sensitivity with plasmonic coupling
Optics Express
|November 18, 2014
Summary
We developed a novel cross-grating structure that significantly enhances the sensitivity of nanometer scale metal gratings. This plasmon-enhanced design achieves picometer resolution for critical dimension measurements.
Area of Science:
- Nanotechnology
- Plasmonics
- Metrology
Background:
- One-dimensional nanometer scale metal gratings are crucial in various applications.
- Enhancing the critical dimension sensitivity of these gratings is essential for advanced metrology.
- Existing methods face limitations in achieving high-resolution measurements.
Purpose of the Study:
- To propose and demonstrate a novel cross-grating structure.
- To enhance the critical dimension sensitivity of nanometer scale metal gratings.
- To achieve sub-angstrom scale sensitivity using localized plasmon interactions.
Main Methods:
- Design and simulation of a cross-grating structure.
- Utilizing the interaction between refractive index changes and localized plasmons.
- Analysis of spectral responses to dimensional variations.
Main Results:
- The cross-grating structure exhibits robust spectral dependence on smaller line width and pitch.
- Demonstrated sub-angstrom scale sensitivity, surpassing typical scatterometry angstrom resolution.
- Achieved picometer resolution, a significant advancement in metrology.
Conclusions:
- The proposed cross-grating structure offers superior critical dimension sensitivity.
- This design leverages plasmonics for ultra-high resolution measurements.
- Experimental validation is anticipated due to favorable design specifications.
