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Simulation, Fabrication and Characterization of THz Metamaterial Absorbers
Published on: December 27, 2012
Distinguishing plasmonic absorption modes by virtue of inversed architectures with tunable atomic-layer-deposited
Yun Zhang1, Kenan Zhang, Tianning Zhang
1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China.
Abstract:
We demonstrated the distinguishing between plasmonic absorption modes by exploiting an inversed architecture with tunable atomic-layer-deposited dielectric spacer layer. The dielectric spacer layer was manipulated between the bottom metal-nanoparticle monolayer and the upper metal film to inspect the contributions of metal nanoparticles and dielectric film in a step-by-step manner. The experimental and simulated differences between the two peak absorption positions (Δf) and between the corresponding half width at half maxima (Δw) confirmed the evolutions of gap plasmon and interference-enhanced local surface plasmon resonance absorption modes in the plasmonic metamaterial absorbers (PMAs), which were useful for understanding the underlying mechanism of amorphous PMAs.

