Related Experiment Video
Updated: Apr 18, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Semiconductor to metal transition in bilayer phosphorene under normal compressive strain
Aaditya Manjanath1, Atanu Samanta, Tribhuwan Pandey
1Materials Research Centre, Indian Institute of Science, Bangalore 560012, India. Centre for Nano Science and Engineering, Indian Institute of Science, Bangalore 560012, India.
Applying normal compressive strain to bilayer phosphorene can tune its electronic properties. This research demonstrates a reversible semiconductor-to-metal transition and direct-to-indirect bandgap shift, paving the way for new phosphorene devices.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Phosphorene, a 2D analog of black phosphorus, exhibits high carrier mobilities and a tunable bandgap.
- Current methods for tuning phosphorene's properties, such as high in-plane strains and electric fields, are experimentally challenging.
Purpose of the Study:
- To investigate the electronic property tuning of bilayer phosphorene using normal compressive strain.
- To explore the feasibility of experimentally achievable strain for property modulation.
Main Methods:
- Density functional theory (DFT) based calculations were employed.
- Phonon spectra were analyzed to assess structural integrity under strain.
Main Results:
- A complete and reversible semiconductor-to-metal transition was observed at 7% strain.
- A direct-to-indirect bandgap transition occurred at 4% strain.
- Structural integrity was maintained at higher strain levels, with minimal changes in carrier mobility and effective mass.
Conclusions:
- Normal compressive strain offers a facile and reversible method for tuning the electronic properties of bilayer phosphorene.
- The observed transitions and preserved transport properties facilitate the development of phosphorene-based multi-physics devices.
More Related Videos
08:12Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
06:57Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
Published on: July 17, 2020
Related Concept Videos
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
Plastic Behavior
Fermi Level Dynamics
Electron affinity in semiconductors refers to the energy gap between the minimum of its conduction band and the vacuum level and it is a critical parameter in determining how easily a semiconductor can accept additional electrons.
The work...
Transformation of Plane Strain
Under plane strain conditions, typical for members where one dimension significantly exceeds the others, deformations and resultant strains are...