Search research articles

ABOUT JoVE

Overview Leadership Blog JoVE Help Center

AUTHORS

Publishing Process Editorial Board Scope & Policies Peer Review FAQ Submit

LIBRARIANS

Testimonials Subscriptions Access Resources Library Advisory Board FAQ

RESEARCH

JoVE Journal Methods Collections JoVE Encyclopedia of Experiments Archive

EDUCATION

JoVE Core JoVE Business JoVE Science Education JoVE Lab Manual Faculty Resource Center Faculty Site

Terms & Conditions of Use

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by

Same author

High-temperature memristors enabled by interfacial engineering.

Science (New York, N.Y.)·2026

Same author

Technology Roadmap of Bioinspired Computing Hardware.

ACS nano·2026

Same author

Real-time signal processing enabled by fused networks on a memristor-based system on a chip.

Science advances·2025

Same author

Emerging Nonvolatile Memory Technologies in the Future of Microelectronics.

ACS omega·2025

Same author

Parallelizing analog in-sensor visual processing with arrays of gate-tunable silicon photodetectors.

Nature communications·2025

Same author

Timing Selector: Using Transient Switching Dynamics to Solve the Sneak Path Issue of Crossbar Arrays.

Small science·2025

Same journal

AFM-Modified Graphene Field-Effect Transistor for Sensitive Detection of Cardiac Troponin I.

Nanotechnology·2026

Same journal

Ultra-Sensitive UV Photodetectors Enabled by Built-in Electric Fields in Hierarchical NP-Type Porous Silicon.

Nanotechnology·2026

Same journal

Effect of sintering temperature on structural, microstructural and magnetic properties of La<sub>0.8</sub>Sr<sub>0.2</sub>MnO<sub>3</sub>: Evolution of faceting and terrace like morphology.

Nanotechnology·2026

Same journal

Engineered V2C MXene Anchored Cu Nanoparticles for Selective Nitrate/Nitrite Sensing and Magneto-Electrocatalytic Hydrogen Evolution Reaction.

Nanotechnology·2026

Same journal

Quantitative Mechanism Separation of Single-Event Transients in Nanosheet Transistors via TCAD Simulation.

Nanotechnology·2026

Same journal

Antibacterial, mechanical and curing properties of PMMA bone cement loaded with copper nanoparticles.

Nanotechnology·2026

See all related articles

Search research articles

Related Experiment Video

Updated: Apr 14, 2026

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Published on: February 8, 2022

Nanoimprint lithography 20 years on.

Qiangfei Xia¹, R Fabian Pease

¹Nanodevices and Integrated Systems Laboratory, Department of Electrical and Computer Engineering, University of Massachusetts, Amherst, MA 01003, USA.

|April 16, 2015

Summary

This summary is machine-generated.

Nanoimprint lithography (NIL) has evolved significantly over 20 years, overcoming fabrication challenges and industrial adoption hurdles. Advancements like roll-to-roll processing enhance its potential for future commercial applications.

More Related Videos

Scalable Stamp Printing and Fabrication of Hemiwicking Surfaces

Scalable Stamp Printing and Fabrication of Hemiwicking Surfaces

Published on: December 18, 2018

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Related Experiment Videos

Last Updated: Apr 14, 2026

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Published on: February 8, 2022

Scalable Stamp Printing and Fabrication of Hemiwicking Surfaces

Scalable Stamp Printing and Fabrication of Hemiwicking Surfaces

Published on: December 18, 2018

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Area of Science:

Materials Science
Nanotechnology
Manufacturing Engineering

Background:

Nanoimprint lithography (NIL) is a key nanofabrication technique.
Its development over two decades has addressed initial challenges.
Understanding its evolution is crucial for future advancements.

Purpose of the Study:

To provide a perspective on the 20-year evolution of nanoimprint lithography.
To analyze past fabrication and industrial adoption challenges.
To identify future commercial deployment opportunities for NIL.

Main Methods:

Review of historical development and technological advancements in NIL.
Analysis of fabrication challenges and industrial integration obstacles.
Exploration of emerging NIL applications and high-throughput methods.

Main Results:

NIL has overcome significant fabrication hurdles since its inception.
Initial industrial uptake was limited by specific challenges.
Emerging techniques, such as roll-to-roll NIL, are improving throughput and viability.

Conclusions:

Nanoimprint lithography has matured considerably over the past two decades.
Continued innovation addresses previous limitations, paving the way for wider industrial use.
NIL is poised for successful commercial deployment in various sectors.