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Updated: Apr 14, 2026
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Determining the Chemical Composition of Corrosion Inhibitor/Metal Interfaces with XPS: Minimizing Post Immersion Oxidation
Published on: March 15, 2017
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Aqueous solution/metal interfaces investigated in operando by photoelectron spectroscopy
O Karslıoğlu1, S Nemšák, I Zegkinoglou
1Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA. HBluhm@lbl.gov.
Faraday Discussions
|April 28, 2015
Summary
A novel in operando method uses thin liquid films and X-ray photoelectron spectroscopy to analyze solid/liquid interfaces. This technique offers elemental and chemical insights into interfaces under realistic conditions.
Area of Science:
- Surface Science
- Analytical Chemistry
- Materials Science
Background:
- Investigating heterogeneous processes at solid/liquid interfaces is crucial for understanding chemical reactions.
- Existing methods often lack elemental specificity or realistic environmental conditions.
Purpose of the Study:
- To introduce a new in operando technique for high-resolution analysis of solid/liquid interfaces.
- To demonstrate the capability of this method under varied solution conditions and electrical bias.
Main Methods:
- Combines the meniscus method for preparing thin liquid films with standing wave ambient pressure X-ray photoelectron spectroscopy (SWAP-XPS).
- Enables elemental and chemical specificity at solid/liquid interfaces.
- Provides sub-nanometer depth resolution.
Main Results:
- The technique successfully analyzed the chemical composition across KOH/Ni interfaces.
- Demonstrated the ability to study interfaces under realistic conditions of concentration, pH, and electrical bias.
Conclusions:
- The described SWAP-XPS technique is a powerful tool for in operando studies of interfacial phenomena.
- Offers unprecedented insights into the chemical nature of solid/liquid interfaces.
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