Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens
Optics Express
|June 16, 2015
Summary
Researchers developed a wedged multilayer Laue lens (MLL) for advanced X-ray nanofocusing. This innovation achieved a 26 nm focus size, paving the way for enhanced hard X-ray microscopy applications.
Area of Science:
- Optics and X-ray instrumentation
- Materials science and fabrication
Background:
- X-ray nanofocusing is crucial for high-resolution imaging.
- Multilayer Laue lenses (MLLs) offer a pathway to achieving smaller focal spots.
- Developing advanced MLLs with precise geometric control is essential.
Purpose of the Study:
- To fabricate and characterize a novel wedged multilayer Laue lens (MLL).
- To assess the performance of the wedged MLL for X-ray nanofocusing applications.
- To validate the effectiveness of a sputtering deposition technique with a custom mask for creating thickness gradients.
Main Methods:
- Fabrication of the wedged MLL using sputtering deposition.
- Implementation of a specially designed mask to control multilayer thickness.
- X-ray characterization at 14.6 keV to determine lens efficiency and focal spot size.
Main Results:
- Successful fabrication of a wedged multilayer Laue lens.
- Achieved an efficiency of 27% at 14.6 keV.
- Demonstrated a focal spot size of 26 nm, consistent with theoretical predictions.
Conclusions:
- The fabrication technique successfully created the desired wedged structure in the MLL.
- The achieved performance indicates significant progress in X-ray nanofocusing optics.
- Further development of wedged MLLs is expected to enhance hard X-ray microscopy capabilities.
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