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Conduction Mechanisms in CVD-Grown Monolayer MoS2 Transistors: From Variable-Range Hopping to Velocity Saturation
G He1, K Ghosh1, U Singisetti1
1†Department of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, New York 14260-1900, United States.
Molybdenum disulfide (MoS2) transistors show great potential as channel materials, exhibiting current saturation and revealing insights into electron mobility limited by charged impurities and variable range hopping.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Monolayer molybdenum disulfide (MoS2) is a promising 2D material for next-generation electronics.
- Understanding charge transport mechanisms in MoS2 is crucial for device optimization.
Purpose of the Study:
- To fabricate and characterize transistors using chemical vapor deposition (CVD)-grown monolayer MoS2.
- To investigate the electrical transport properties and identify limiting factors in MoS2 transistors.
Main Methods:
- Fabrication of transistors from CVD-grown monolayer MoS2 crystals.
- Electrical characterization of current-voltage (I-V) behavior at varying drain voltages (Vd).
- Analysis of low-field mobility and high-field transport phenomena.
Main Results:
- Demonstrated excellent current saturation at large drain voltages (Vd).
- Identified electron mobility limited by charged impurity scattering at low fields.
- Observed variable range hopping at low Vd and velocity saturation at higher Vd.
Conclusions:
- Monolayer MoS2 exhibits significant potential as a channel-replacement material in transistors.
- Multiple transport phenomena, including impurity scattering and hopping, govern MoS2 transistor performance.
- Further research can focus on mitigating scattering and optimizing MoS2 for enhanced electronic applications.
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