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Linear response, multi-order grating interferometry using a reversal shearing imaging system.

Zhang Tao, Jiubin Tan, Jiwen Cui

|October 1, 2015

Summary

This summary is machine-generated.

A new grating interferometry method precisely measures displacement. This system achieves 98.7% linearity and 10 nm resolution, offering a potent tool for displacement metrology.

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Area of Science:

Optics and Metrology
Interferometry
Nanotechnology

Background:

Accurate displacement measurement is crucial in metrology.
Traditional methods may lack linearity or sufficient resolution.
Grating interferometry offers potential for high-precision measurements.

Purpose of the Study:

To propose and validate a novel linear response, multi-order grating interferometry system.
To develop a theoretical model for analyzing multi-order signals.
To demonstrate high linearity and resolution in displacement measurement.

Main Methods:

The system combines a reversal shearing interferometer with an imaging system.
Multi-order, integrated intensity signals with linear waveform response are calculated.
A theoretical multi-order model using Fourier series expansion is presented.

Main Results:

Experimental results validate the theoretical model.
The system demonstrates a linear response to displacement with 98.7% linearity.
A resolution of 10 nm was achieved.

Conclusions:

The proposed method establishes a potent linear response grating interferometry for displacement metrology.
This technique advances precision measurement capabilities.
It enables the development of new interferometric tools.