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Improved carrier injection in GaN-based VCSEL via AlGaN/GaN multiple quantum barrier electron blocking layer.
Optics Express
|October 20, 2015
Summary
Researchers improved the performance of III-nitride vertical-cavity surface-emitting lasers (VCSELs) by using a novel AlGaN/GaN multiple quantum barrier (MQB) electron blocking layer (EBL). This enhancement significantly boosts output power and reduces threshold current density.
Area of Science:
- Optoelectronics
- Materials Science
- Semiconductor Physics
Background:
- III-nitride based vertical-cavity surface-emitting lasers (VCSELs) are crucial optoelectronic devices.
- Conventional VCSELs often utilize a bulk AlGaN electron blocking layer (EBL).
- Improving the efficiency and performance of VCSELs remains an active area of research.
Purpose of the Study:
- To demonstrate improved lasing performance in III-nitride VCSELs.
- To investigate the effect of replacing a bulk AlGaN EBL with an AlGaN/GaN multiple quantum barrier (MQB) EBL.
- To analyze the underlying mechanisms for performance enhancement.
Main Methods:
- Fabrication of III-nitride VCSELs with a conventional bulk AlGaN EBL.
- Fabrication of III-nitride VCSELs with an AlGaN/GaN MQB EBL.
- Experimental characterization of lasing performance, including output power and threshold current density.
- Theoretical calculations to understand carrier dynamics and strain effects.
Main Results:
- The output power of VCSELs with the MQB-EBL was enhanced up to three times (0.3 mW to 0.9 mW).
- The threshold current density was reduced from 12 kA/cm2 (9.5 mA) to 10.6 kA/cm2 (8.5 mA) with the MQB-EBL.
- Theoretical calculations indicated improved carrier injection efficiency due to strain release and quantum interference in the MQB structure.
Conclusions:
- Replacing the bulk AlGaN EBL with an AlGaN/GaN MQB EBL significantly improves VCSEL lasing performance.
- The MQB structure enhances carrier injection efficiency by increasing the effective conduction band barrier height.
- This approach offers a promising strategy for developing high-performance III-nitride optoelectronic devices.
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