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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

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Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
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Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview01:19

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In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then...
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Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

954
Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used....
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Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

790
AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
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Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

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The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
1.5K
Atomic Emission Spectroscopy: Overview01:20

Atomic Emission Spectroscopy: Overview

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Atomic emission spectroscopy (AES) is an analytical technique used to determine the elemental composition of a sample by analyzing the light emitted from excited atoms. In AES, atoms in a sample are excited to higher energy levels by thermal energy from high-temperature sources, such as plasma, arcs, or sparks. When these excited atoms return to lower energy states, they emit light at specific wavelengths characteristic of each element. The resulting atomic emission spectrum, which consists of...
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Plasma Characteristics Using Superimposed Dual Frequency Inductively Coupled Plasma Source for Next Generation Device

Seung Min Lee, Chul Hee Lee, Tae Hyung Kim

    Journal of Nanoscience and Nanotechnology
    |January 5, 2016
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    Summary
    This summary is machine-generated.

    Dual frequency power in a U-shaped inductively coupled plasma (ICP) source enhances plasma density and uniformity for flexible display processing. This method improves processing uniformity and reduces substrate damage.

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    Area of Science:

    • Materials Science
    • Plasma Physics
    • Surface Engineering

    Background:

    • Flexible display manufacturing requires advanced plasma processing techniques.
    • Inductively Coupled Plasma (ICP) sources are crucial for uniform plasma generation.
    • Optimizing ICP sources for roll-to-roll processing is essential for next-generation electronics.

    Purpose of the Study:

    • Investigate a U-shaped ICP source as a linear plasma source for flexible display processing.
    • Evaluate the effect of dual radio frequency (RF) power on plasma characteristics.
    • Determine the impact of dual frequency on plasma density, electron temperature, and uniformity.

    Main Methods:

    • Utilized a U-shaped ICP source operating at 200 mTorr Argon pressure.
    • Applied dual frequency RF power (13.56 MHz and 2 MHz) to the ICP source.
    • Measured plasma density, electron temperature, and photoresist etch uniformity.

    Main Results:

    • Superimposed dual frequency (13.56 MHz + 2 MHz) slightly increased plasma density compared to single frequency (13.56 MHz) at equal total power.
    • Adding 2 MHz RF power decreased electron temperature.
    • Achieved improved plasma and process uniformity with dual frequency application.

    Conclusions:

    • Dual frequency power enhances plasma density and uniformity in U-shaped ICP sources.
    • This technique is beneficial for roll-to-roll flexible display processing.
    • The dual frequency approach offers improved plasma characteristics and reduced substrate damage potential.