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Functional nickel-based deposits synthesized by focused beam induced processing
R Córdoba1, B Barcones, E Roelfsema
1Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven, The Netherlands.
Nanotechnology
|January 14, 2016
Summary
Researchers developed nickel oxide (NiO) nanostructures using focused electron beam induced processing (FEBIP). This breakthrough enables the fabrication of advanced functional nanodevices for nanoelectronics applications.
Area of Science:
- Materials Science
- Nanotechnology
- Nanoelectronics
Background:
- Focused electron/ion beam induced processing (FEBIP/FIBIP) is crucial for fabricating functional nanostructures.
- Advancements in nanoelectronics require the development of novel materials.
Purpose of the Study:
- To report the successful fabrication of nickel-based deposits, specifically nickel oxide (NiO), using FEBIP/FIBIP.
- To explore the potential of NiO nanostructures in nanoelectronic devices.
Main Methods:
- Utilized bis(methyl cyclopentadienyl)nickel as a precursor for FEBIP/FIBIP.
- Employed an in situ two-step process at room temperature, involving focused electron beam irradiation under O2 flux to convert Ni deposits to NiO.
- Characterized the NiO deposits for purity, resistivity, crystal structure, and grain size.
Main Results:
- Achieved fabrication of highly pure NiO deposits with a resistivity of 2000 Ωcm.
- NiO deposits exhibited a polycrystalline structure with a face-centred cubic lattice and 5 nm grains.
- Demonstrated resistance switching and exchange-bias effects in NiO systems fabricated by FEBIP.
Conclusions:
- FEBIP is effective for synthesizing high-purity NiO nanostructures.
- NiO nanostructures fabricated via FEBIP show promise for nanoelectronic applications, including resistance switching and exchange-bias phenomena.
- This work represents a significant advancement towards utilizing FEBIP for functional nanodevice fabrication.

