Calibration procedures for quantitative multiple wavelengths reflectance microscopy

In order to characterize surface chemo-mechanical phenomena driving micro-electro-mechanical systems (MEMSs) behavior, it has been previously proposed to use reflected intensity fields obtained from a standard microscope for different illumination wavelengths. Wavelength-dependent and -independent reflectivity fields are obtained from these images, provided the relative reflectance sensitivities ratio can be identified. This contribution focuses on the necessary calibration procedures and mathematical methods allowing for a quantitative conversion from a mechanically induced reflectivity field to a surface rotation field, therefore paving the way for a quantitative mechanical analysis of MEMS under chemical loading.