Related Experiment Video
Updated: Mar 25, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Contact gating at GHz frequency in graphene
Q Wilmart1, A Inhofer1, M Boukhicha1
1Laboratoire Pierre Aigrain, Ecole Normale Supérieure-PSL Research University, CNRS, Université Pierre et Marie Curie-Sorbonne Universités, Université Paris Diderot-Sorbonne Paris Cité, 24 rue Lhomond, 75231 Paris Cedex 05, France.
This study introduces novel graphene transistor designs using independent contact gates to overcome performance limitations. These new gates enable GHz operation and offer enhanced control for electronics and optoelectronics applications.
Area of Science:
- Condensed Matter Physics
- Materials Science
- Nanotechnology
Background:
- Graphene transistors traditionally rely on channel gate modulation, facing scaling limits and performance issues from contact resistances.
- Existing architectures are constrained by channel length scaling and parasitic resistances, hindering optimal device operation.
Purpose of the Study:
- To propose and demonstrate a novel graphene transistor design utilizing independent contact gates.
- To overcome the limitations of standard channel gating architectures in graphene devices.
- To achieve enhanced control over Klein barriers at contact edges for improved performance.
Main Methods:
- Implementation of additional local gates beneath the contact regions of graphene transistors.
- Demonstration of GHz operational frequencies for transistors driven by these novel contact gates.
- Benchmarking of standard channel gating against the proposed contact gating technique.
Main Results:
- Successful demonstration of GHz operation in graphene transistors with independent contact gates.
- Achieved state-of-the-art dynamical transconductance levels using the novel contact gating method.
- Full control over the Klein barrier at the contact edge was established.
Conclusions:
- The novel contact gating design overcomes scaling limits and performance restrictions of traditional graphene transistors.
- Independent contact gates offer precise control over Fermi level and electrostatic potential, beneficial for electronics and optoelectronics.
- This approach provides an alternative to conventional local channel gates, enabling advanced device functionalities.
Related Concept Videos
Biasing of FET
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
Characteristics of MOSFET
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable...

