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Stitching interferometry for ellipsoidal x-ray mirrors.

Hirokatsu Yumoto1, Takahisa Koyama1, Satoshi Matsuyama2

  • 1Japan Synchrotron Radiation Research Institute/SPring-8, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan.

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Summary
This summary is machine-generated.

A new surface metrology system accurately measures nano-focusing ellipsoidal mirrors, overcoming challenges with small radii of curvature. This advancement enables the fabrication of advanced x-ray optics.

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Area of Science:

  • Optics
  • Metrology
  • Materials Science

Background:

  • Ellipsoidal mirrors offer superior two-dimensional x-ray focusing compared to elliptical-cylinder mirrors.
  • Fabricating nano-focusing ellipsoidal mirrors is challenging due to metrology difficulties stemming from small radii of curvature.

Purpose of the Study:

  • To develop a surface metrology system for nano-focusing ellipsoidal mirrors.
  • To address the challenges in measuring the precise surface shapes of these advanced x-ray optics.

Main Methods:

  • Utilized stitching interferometric techniques combining microscopic and Fizeau interferometers.
  • Developed correction methods for systematic errors, specifically off-axis aberrations from the microscopic interferometer.
  • Measured sub-aperture shapes and their tilt angles, then stitched them using relative angles.

Main Results:

  • Achieved a measurement repeatability of 0.51 nm (root-mean-square) for an ellipsoidal mirror with a 3.6-mm radius of curvature.
  • The metrology system demonstrated accuracy suitable for nano-focusing x-ray mirror surface requirements.
  • Successfully estimated systematic errors by measuring tilted plane and ellipsoidal substrates.

Conclusions:

  • The developed stitching interferometric metrology system is effective for nano-focusing ellipsoidal mirrors.
  • This system overcomes previous limitations in surface metrology for such optics.
  • The technology is poised to facilitate the fabrication of next-generation nano-focusing ellipsoidal x-ray mirrors.