Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer...

Area of Science:

• Materials Science
• Surface Science
• Nanotechnology

Background:

• In situ characterization is crucial for understanding complex material growth processes.
• Atomic Layer Deposition (ALD) requires precise control over film formation at the atomic level.
• Synchrotron-based techniques offer high sensitivity and resolution for probing material properties.

Purpose of the Study:

• To design and implement a versatile mobile setup for in situ synchrotron-based studies during atomic layer processing.
• To enable simultaneous Grazing Incidence Small Angle X-ray Scattering (GISAXS), X-ray Fluorescence (XRF), and X-ray Absorption Spectroscopy (XAS) measurements.
• To investigate the nucleation and growth mechanisms of thin films during both thermal and plasma-enhanced ALD.

Main Methods:

• Development of a compact high vacuum pump-type reactor integrated with a remote radio frequency plasma source.
• Installation and successful operation of the mobile setup at European Synchrotron Radiation Facility (ESRF) and SOLEIL synchrotron beamlines.
• In situ GISAXS and XRF measurements during ruthenium ALD using RuO4 precursor with H2 or H2 plasma.

Main Results:

• Demonstration of the system's capability to perform in situ GISAXS, XRF, and XAS during ALD.
• Acquisition of real-time data providing insights into the nucleation and initial growth stages of ruthenium films.
• Successful characterization of both thermal and plasma-enhanced ALD processes.

Conclusions:

• The developed mobile setup is a powerful tool for in situ synchrotron studies in atomic layer processing.
• The system facilitates a deeper understanding of ALD nucleation and growth mechanisms.
• This technology advances in situ characterization capabilities for thin film deposition research.