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Nonionic Fluorinated Surfactant Removal from Mesoporous Film Using sc-CO2
Elvia A Chavez Panduro1,2,3, Karine Assaker4, Thomas Beuvier2
1Deparment of Physics, Norwegian University of Science and Technology ,Høgskoleringen 5, 7491 Trondheim, Norway.
ACS Applied Materials & Interfaces
|December 29, 2016
Summary
This study demonstrates the successful creation of ordered silica thin films using a fluorinated surfactant template. Supercritical carbon dioxide effectively removed the template, preserving the film
Area of Science:
- Materials Science
- Nanotechnology
- Physical Chemistry
Background:
- Thin films are crucial in various technological applications.
- Controlling nanostructure in silica films is essential for tailored properties.
- Surfactant templating offers a route to ordered porous materials.
Purpose of the Study:
- To identify the optimal composition for a 2D rectangular crystalline phase in surfactant-templated silica films.
- To investigate the effectiveness of supercritical carbon dioxide (sc-CO2) for template removal.
- To characterize the structural integrity of the silica films after template removal.
Main Methods:
- Self-assembly of silica thin films via dip-coating using a partially fluorinated surfactant (R8F(EO)9).
- In situ X-ray reflectivity (XRR) and grazing incidence small-angle X-ray scattering (GISAXS) under varying sc-CO2 pressures (0-100 bar at 34 °C).
- Analysis of structural changes and template removal efficiency.
Main Results:
- A 2D rectangular structure was formed at a specific molar ratio (R8F(EO)9/Si = 0.1).
- Supercritical carbon dioxide successfully removed the R8F(EO)9 surfactant.
- The 2D rectangular structure was maintained after template removal and depressurization.
- High stability of the final silica film attributed to thick walls and small pore size.
Conclusions:
- The study successfully fabricated ordered 2D rectangular silica thin films.
- sc-CO2 is an effective and structure-preserving method for template removal.
- The resulting silica films exhibit high stability, suitable for advanced applications.

