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Updated: Mar 8, 2026

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
General criterion to distinguish between Schottky and Ohmic contacts at the metal/two-dimensional semiconductor
Yanwen Chen1, Yuanchang Li2, Jian Wu1
1Department of Physics and State Key Laboratory of Low-Dimensional Quantum Physics, Tsinghua University, Beijing 100084, People's Republic of China. dwh@phys.tsinghua.edu.cn.
Abstract:
The contact interface plays a crucial role in the performance of various nanoelectronic devices based on two-dimensional (2D) semiconductors. Using first-principles calculations, we investigate the nature of single-layer titanium trisulfide (TiS3) and metal contacts as a prototype system. We find that the contacts with Au(111), Ag(111), Al(111) and Cu(111) are of the Schottky type with barriers of 2.15, 1.67, 1.55 and 0.84 eV while that with Sc(111) is of a low-resistance Ohmic type. By comparing with several other typical 2D semiconductor-metal contacts, we propose that the contact type (i.e., Schottky or Ohmic) can be preliminarily identified according to the separation between the metal and the 2D semiconductor, which can be conveniently measured in experiments, with a critical value of ∼2.3 ± 0.2 Å.
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