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Updated: Mar 6, 2026

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Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Published on: January 19, 2020
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A silicon neural probe fabricated using DRIE on bonded thin silicon.
Summary
Researchers developed novel silicon neural probes using deep reactive ion etching for enhanced in-vivo testing. These probes successfully recorded neural activity in mice, showing potential for Parkinson
Area of Science:
- Neuroscience
- Materials Science
- Biomedical Engineering
Background:
- Parylene-C based neural probes are essential for in-vivo studies.
- Dissolvable needles are used to embed probes, but can affect encapsulation property testing.
- Silicon wafer thinning is challenging to integrate into neural probe fabrication.
Purpose of the Study:
- To develop a novel silicon neural probe fabrication process.
- To enable in-vivo testing of parylene-C encapsulation without confounding factors.
- To integrate silicon wafer thinning into neural probe manufacturing for variable probe thicknesses.
Main Methods:
- Deep reactive ion etching on 250 μm thin silicon wafers.
- Photolithography on substrates bonded with backgrinding liquid wax (BGL7080).
- Electrochemical impedance spectroscopy (EIS) for electrode characterization.
Main Results:
- Fabricated silicon neural probes mimic existing designs for in-vivo testing.
- Successful photolithography on thinned silicon wafers bonded with wax.
- Measured impedance of ~80 kΩ at 1 kHz for platinum electrodes, indicating recording capability.
- Successful recording of neural activity in the substantia nigra of a mouse.
Conclusions:
- The developed deep reactive ion etching process enables fabrication of silicon neural probes.
- This technique allows for effective in-vivo testing of parylene-C encapsulation.
- The probes show promise for studying neural activity, particularly in Parkinson's disease research.

