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Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation
Alfredo Mameli1, Yinghuan Kuang1, Morteza Aghaee1
1Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
Chemistry of Materials : a Publication of the American Chemical Society
|April 14, 2017
Abstract
No abstract available in PubMed .
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