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Atomic Force Microscopy01:08

Atomic Force Microscopy

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Atomic force microscopy (AFM) is a type of scanning probe microscopy that can analyze topographic details of various specimens like ceramics, glass, polymers, and biological samples. AFM offers over 1000 times more resolution than the optical imaging system. Images generated from AFM are three-dimensional surface profiles, offering an advantage over the flat, two-dimensional images from other imaging techniques.
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The early pioneers of microscopy opened a window into the invisible world of microorganisms. In 1830, Joseph Jackson Lister created an essentially modern light microscope. The 20th century saw the development of microscopes that leveraged nonvisible light, such as fluorescence microscopy that uses an ultraviolet light source and electron microscopy that uses short-wavelength electron beams. These advances significantly improved magnification, image resolution, and contrast. By comparison, the...
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Related Experiment Video

Updated: Mar 1, 2026

Author Spotlight: Introduction to Active Probe Atomic Force Microscopy with Quattro-Parallel Cantilever Arrays
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In-Process Atomic-Force Microscopy (AFM) Based Inspection.

Samir Mekid1

  • 1Mechanical Engineering Department, King Fahd University of Petroleum and Minerals, Dhahran 31261, Saudi Arabia. smekid@kfupm.edu.sa.

Sensors (Basel, Switzerland)
|June 1, 2017
PubMed
Summary

This study introduces an in-process atomic-force microscopy (AFM) inspection for nanolithography, using a dual-probe system to enhance precision and understand probe wear during nanomachining.

Keywords:
AFMin-process inspectionnanomachiningnanoscale inspectionprobes

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Area of Science:

  • Nanotechnology
  • Materials Science
  • Metrology

Background:

  • Traditional nanolithography using atomic-force microscopy (AFM) probes suffers from probe tip degradation during in-situ inspection, compromising measurement accuracy.
  • Existing methods require retracting the probe for inspection, interrupting the nanomachining process and potentially altering results.

Purpose of the Study:

  • To develop and present a novel in-process inspection method for nanolithography using AFM.
  • To compensate for deviations and probe tip wear during the nanolithography process.
  • To improve the quality and understanding of nanomachining.

Main Methods:

  • Implementation of a dual-probe system with one AFM probe for lithography and a second, dedicated probe for inspection.
  • Positioning the probes back-to-back under two synchronized controllers for real-time process correction.
  • Integration of the system within a nanomanipulator for research and educational applications.

Main Results:

  • Demonstrated significant quality improvement in nanomachining processes.
  • Enabled real-time monitoring and understanding of probe tip wear during operation.
  • Provided a method to correct deviations from specified parameters during nanolithography.

Conclusions:

  • The proposed in-process AFM inspection method enhances nanolithography precision and quality.
  • The dual-probe system effectively addresses probe tip degradation and process deviations.
  • This approach offers a better understanding of nanomachining dynamics and probe behavior.