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On-chip surface-enhanced Raman spectroscopy using nanosphere-lithography patterned antennas on silicon nitride
We developed an electron-beam-free method to create miniaturized chips for surface-enhanced Raman spectroscopy (SERS). This advancement allows for high-throughput SERS assays with enhanced sensitivity on integrated photonic platforms.
Area of Science:
- Nanophotonics
- Spectroscopy
- Materials Science
Background:
- Miniaturized chips integrating nanoplasmonic antennas with silicon nitride waveguides enable surface-enhanced Raman spectroscopy (SERS) for high-throughput assays.
- Current fabrication methods using electron-beam lithography are complex and limit the use of integrated photonics platforms.
Purpose of the Study:
- To demonstrate an electron-beam-free fabrication method for nanoplasmonic antennas on silicon nitride waveguides.
- To optimize these integrated devices for enhanced SERS performance at visible and near-infrared wavelengths.
Main Methods:
- Utilized nanosphere lithography for fabricating gold nanotriangles on deep-UV patterned silicon nitride waveguides.
- Optimized localized surface-plasmon resonance for Raman excitation at 785 nm.
Main Results:
- Achieved a SERS substrate enhancement factor of 2.5 × 105.
- Demonstrated that SERS signal excited and collected through the waveguide is comparable to free-space excitation with a high NA objective.
Conclusions:
- Developed a simplified, electron-beam-free fabrication process for integrated SERS chips.
- The fabricated devices offer high sensitivity and efficient signal collection via on-chip photonics, paving the way for broader adoption.
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