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Sequential Feature-Density Doubling for Ultraviolet Plasmonics.

Michael P Knudson1, Alexander J Hryn1, Mark D Huntington1

  • 1Department of Materials Science and Engineering and ‡Department of Chemistry, Northwestern University , Evanston, Illinois 60208, United States.

ACS Applied Materials & Interfaces
|September 14, 2017
PubMed
Summary
This summary is machine-generated.

This study presents a scalable method to create dense nanopatterns down to 100 nm. The technique uses controlled etching and template stripping to generate aluminum nanogratings for plasmonics.

Keywords:
aluminumlithographynanopatterningsurface plasmontemplate strippingultraviolet plasmonics

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Optics

Background:

  • Fabricating nanostructures with sub-200 nm periodicities over large areas is difficult with current methods.
  • Achieving high feature density is crucial for advanced optical and electronic applications.

Purpose of the Study:

  • To demonstrate a scalable technique for feature-density doubling in nanopatterning.
  • To generate nanopatterned lines with periodicities down to 100 nm over centimeter-square areas.

Main Methods:

  • Controlled wet overetching of atomic-layer deposited alumina masks to achieve nanoscale feature sizes.
  • Transferring features into silicon to create masters for template stripping.
  • Fabricating aluminum nanogratings with varying periodicities via template stripping.

Main Results:

  • Successfully generated nanopatterned lines with periodicities down to 100 nm over areas greater than 3 cm2.
  • Demonstrated feature-density doubling capability.
  • Aluminum nanogratings exhibited surface plasmon polariton modes at ultraviolet wavelengths.

Conclusions:

  • The developed method offers a scalable solution for producing high-density nanopatterns.
  • The observed plasmonic behavior is dependent on nanograting periodicity and excitation angle, aligning with theoretical predictions.