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Probing plasma fluorinated graphene via spectromicroscopy
C Struzzi1, M Scardamaglia, N Reckinger
1Chimie des Interactions Plasma-Surface, CIRMAP, University of Mons, 7000 Mons, Belgium.
Physical Chemistry Chemical Physics : PCCP
|November 21, 2017
Summary
Plasma fluorination of graphene using CF4 and SF6 was investigated. Ion energy controls adatom clustering with CF4 and sulfur bonding with SF6, enabling controlled graphene functionalization.
Area of Science:
- Materials Science
- Surface Chemistry
- Nanotechnology
Background:
- Graphene functionalization is crucial for tailoring its electronic and chemical properties.
- Plasma-based methods offer efficient routes for graphene modification.
- Understanding fluorination mechanisms is key to controlling graphene's surface chemistry.
Purpose of the Study:
- To investigate the plasma fluorination of supported graphene using CF4 and SF6 gas precursors.
- To elucidate the role of ion acceleration in the fluorination mechanism and functionalization yield.
- To control the homogeneity of fluorination on individual graphene flakes.
Main Methods:
- Plasma treatment with CF4 and SF6 gases.
- Spectroscopy and microscopy techniques for analysis.
- Scanning photoelectron microscopy (SPEM) with 100 nm spatial resolution.
Main Results:
- Adatom clustering during CF4 plasma treatment is suppressed by increasing ion kinetic energy.
- Sulfur atoms from SF6 plasma preferentially bond to copper substrates, not graphene, unless ion energy is restricted.
- SPEM enabled regional evaluation of chemical bonding and control over functionalization homogeneity.
Conclusions:
- Ion kinetic energy is a critical parameter for controlling plasma fluorination outcomes in graphene.
- Tailoring ion energy allows for selective functionalization and suppression of unwanted side reactions.
- This study provides insights for precise control over graphene's chemical modification for advanced applications.
