At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis

Optics Express
|February 25, 2018
PubMed
Summary

Unified Modulated Pattern Analysis (UMPA) offers a cost-effective method for high-sensitivity X-ray optics characterization. This technique effectively quantifies beam damage and shape errors in refractive lenses, aiding optics development.

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