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Updated: Feb 14, 2026

10:39
Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating
Published on: October 11, 2016
10.1K
At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis
Optics Express
|February 25, 2018
Summary
Unified Modulated Pattern Analysis (UMPA) offers a cost-effective method for high-sensitivity X-ray optics characterization. This technique effectively quantifies beam damage and shape errors in refractive lenses, aiding optics development.
Area of Science:
- Optics and Photonics
- X-ray Science and Technology
- Materials Science
Background:
- Advances in new-generation X-ray sources necessitate improved high-performance optics.
- High-sensitivity phase sensing and wavefront characterization are crucial for optics quality control and development.
- At-wavelength characterization techniques are increasingly required.
Purpose of the Study:
- To demonstrate the utility of Unified Modulated Pattern Analysis (UMPA) for X-ray optics characterization.
- To quantify the impact of beam damage and shape errors on polymer X-ray refractive lenses.
- To validate UMPA against conventional X-ray grating interferometry.
Main Methods:
- Characterization of two polymer X-ray refractive lenses using UMPA.
- Utilized two distinct UMPA experimental setups.
- Validated UMPA measurements against traditional X-ray grating interferometry.
Main Results:
- UMPA successfully characterized polymer X-ray refractive lenses.
- Quantified the effects of beam damage and shape errors on lens refractive properties.
- UMPA measurements were consistent with conventional grating interferometry.
Conclusions:
- UMPA is a versatile tool for high-sensitivity phase sensing and wavefront characterization.
- UMPA's adaptability, ease of implementation, and cost-effectiveness make it suitable for optics development.
- Expected to enable high-throughput quantitative optics characterization and wavefront sensing.
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