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Updated: Feb 13, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Hartmann characterization of the PEEM-3 aberration-corrected X-ray photoemission electron microscope

A Scholl1, M A Marcus1, A Doran1

  • 1Advanced Light Source, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley CA 94720, USA.

Ultramicroscopy
|March 20, 2018
PubMed

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